Takeaki Ebihara
Technical Staff at Canon Inc
SPIE Involvement:
Author
Publications (19)

Proceedings Article | 24 March 2009
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Semiconductors, Data modeling, Inspection, Control systems, Finite element methods, Semiconductor manufacturing, High volume manufacturing, Critical dimension metrology, Semiconducting wafers, Wafer testing

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Light sources, Metrology, Etching, Control systems, Distortion, Data processing, Double patterning technology, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Polarization, Particles, Inspection, Distortion, Bridges, Scanning probe microscopy, Thin film coatings, Semiconducting wafers, Overlay metrology, Liquids

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Refractive index, Metrology, Polarization, Imaging systems, Sensors, Glasses, Optical alignment, Semiconducting wafers, Overlay metrology, Defect inspection

Proceedings Article | 20 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Monochromatic aberrations, Metrology, Polarization, Birefringence, Calibration, Error analysis, Wavefront aberrations, Image analysis, Device simulation, Resolution enhancement technologies

Proceedings Article | 12 May 2005
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Monochromatic aberrations, Light sources, Reticles, Metrology, Error analysis, Inspection, Optical testing, Scanning electron microscopy, CCD cameras, Photomasks

Showing 5 of 19 publications
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