Takehiko Iwanaga
at Canon Inc
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 21 September 2020 Presentation
Proc. SPIE. 11518, Photomask Technology 2020
KEYWORDS: Semiconductors, Optical lithography, Ultraviolet radiation, Manufacturing, Photomasks, Semiconductor manufacturing, Computational lithography, Nanoimprint lithography, Photoresist processing, Stochastic processes

Proceedings Article | 23 March 2020 Paper
Proc. SPIE. 11324, Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
KEYWORDS: Lithography, Optical lithography, Distortion, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 26 September 2019 Presentation + Paper
Proc. SPIE. 11148, Photomask Technology 2019
KEYWORDS: Lithography, Optical lithography, Capillaries, Particles, Photomasks, Semiconductor manufacturing, Nanoimprint lithography, Manufacturing equipment, Semiconducting wafers, Stochastic processes

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Optical lithography, Distortion, Photomasks, Source mask optimization, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Wafer testing, Overlay metrology

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Semiconductors, Lithography, Optical lithography, Particles, Manufacturing, Photomasks, Line width roughness, Semiconductor manufacturing, Nanoimprint lithography, Semiconducting wafers

Showing 5 of 11 publications
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