Dr. Takehiko Naruoka
at JSR Corp
SPIE Involvement:
Author
Publications (12)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Light sources, Polymers, Ultraviolet radiation, Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, Chemical reactions, Picosecond phenomena, Line edge roughness, Floods, Industrial chemicals, Absorption, Chemically amplified resists

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Polymers, Image processing, Scanners, Ultraviolet radiation, Extreme ultraviolet, Line width roughness, Image enhancement, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Stochastic processes, Floods, Chemically amplified resists

SPIE Journal Paper | July 15, 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Line width roughness, Extreme ultraviolet lithography, Electroluminescence, Extreme ultraviolet, Scanning electron microscopy, Chemically amplified resists, Lithography, Photomasks, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | March 25, 2016
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Semiconductors, Lithography, Electron beam lithography, Metals, Ultraviolet radiation, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Picosecond phenomena, Floods

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Polymers, Image processing, Ultraviolet radiation, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Picosecond phenomena, Line edge roughness, Floods, Absorption

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Semiconductors, Lithography, Light sources, Manufacturing, Electroluminescence, Scanning electron microscopy, Electronic components, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Line edge roughness, Floods, Industrial chemicals, Chemically amplified resists

Showing 5 of 12 publications
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