Takehiro Seshimo
Visiting Scientist from TOK at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Oxides, Carbon, Optical lithography, Etching, Polymers, Silicon, Scanning electron microscopy, Silicon carbide, Reactive ion etching, System on a chip

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Semiconductors, Thin films, Lithography, Optical lithography, Etching, Dry etching, Polymers, Annealing, Silicon, Nitrogen, Manufacturing, Control systems, Scanning electron microscopy, Directed self assembly

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Optical lithography, Etching, Polymers, Annealing, Silicon, Coating, Resistance, Polymerization, Directed self assembly

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Optical lithography, Polymers, Diffusion, Chemistry, Scanning electron microscopy, Photomasks, Absorbance, Chemical analysis, Line edge roughness

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Sensors, Polymers, Silicon, Hydrogen, Diffusion, Photoresist materials, Molecular interactions, Semiconducting wafers, Chemically amplified resists

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