Mr. Takeo Hashimoto
Chief Researcher at ASET
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Finite-difference time-domain method, Silicon, Inspection, Reflectivity, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Molybdenum, Semiconducting wafers

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Optical lithography, Image processing, Wavefronts, Printing, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | May 6, 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Finite-difference time-domain method, Silicon, Inspection, Reflectivity, Chromium, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Analytical research, Semiconducting wafers

PROCEEDINGS ARTICLE | August 20, 2004
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Optical spheres, Particles, Silicon, Inspection, Surface roughness, Interference (communication), Photonics, Photomasks, Extreme ultraviolet lithography, Particle systems

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Refractive index, Reflectivity, Optical testing, Near field, Photomasks, Extreme ultraviolet lithography, Tantalum, Mass attenuation coefficient, Semiconducting wafers, Mineralogy

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beams, Defect detection, Sputter deposition, Silicon, Inspection, Photomasks, Extreme ultraviolet lithography, Molybdenum, Phase shifts

Showing 5 of 6 publications
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