Dr. Takeo Ishibashi
at Renesas Technology Corp
SPIE Involvement:
Author
Publications (12)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Scanners, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Photoresist processing, Semiconducting wafers

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Semiconductors, Optical filters, Microfluidics, Particles, Manufacturing, Scanning electron microscopy, Photoresist processing, Semiconducting wafers, Standards development, Liquids

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Particles, Silicon, Calcium, Coating, Manufacturing, Immersion lithography, Head-mounted displays, Fluorine, Semiconducting wafers, Prototyping

Proceedings Article | 7 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: FT-IR spectroscopy, Optical lithography, Silica, Etching, Silicon, Coating, Scanning electron microscopy, Photomasks, Double patterning technology, Photoresist processing

Proceedings Article | 2 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Polymers, Water, Digital watermarking, Surface properties, Bridges, Chemical analysis, Immersion lithography, Semiconducting wafers, Standards development, Defect inspection

Proceedings Article | 2 April 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Carbon, Refractive index, FT-IR spectroscopy, Etching, Reflectivity, Raman spectroscopy, Photoresist processing, System on a chip, Plasma treatment, Plasma

Showing 5 of 12 publications
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