Dr. Takeo Nakano
at Tokyo Electron Yamanashi Ltd
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Optical lithography, Polymethylmethacrylate, Polymers, Error analysis, Computer simulations, Numerical analysis, Directed self assembly, Double patterning technology, Picosecond phenomena, Critical dimension metrology

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Image processing, Manufacturing, Ecosystems, Line width roughness, Directed self assembly, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Polymethylmethacrylate, Polymers, Particles, Error analysis, Computer simulations, Data acquisition, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Tolerancing

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Polymethylmethacrylate, Particles, 3D modeling, Scanning electron microscopy, Monte Carlo methods, Photomasks, Directed self assembly, Picosecond phenomena, Scanning transmission electron microscopy

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Manufacturing, Ecosystems, Directed self assembly, High volume manufacturing, Manufacturing equipment, Thin film coatings, Semiconducting wafers

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Fabrication, Semiconductors, Lithography, Polymethylmethacrylate, Polymers, Particles, Computer simulations, Monte Carlo methods, Directed self assembly, Nanolithography

Showing 5 of 6 publications
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