Dr. Takeshi Iwai Profile

Dr. Takeshi Iwai

at Tokyo Ohka Kogyo Co Ltd

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 5 March 2021 Presentation

High-power AlGaN UVC LEDs using PhC reflector p-contact layers

Hideki Hirayama, Yukio Kashima, Eriko Matsuura, Noritoshi Maeda, Masafumi Jo, Yasushi Iwaisako, Takeshi Iwai, Mitsunori Kokubo, Takaharu Tashiro, Kanji Furuta, Ryuichiro Kamimura, Tamato Osada, Hideki Takagi, Yuuichi Kurashima, Tsugumu Nagano

Proceedings Volume 11686, 116860X (2021) https://doi.org/10.1117/12.2579591

KEYWORDS: Reflectors, Light emitting diodes, Resistance, Photonic crystals, External quantum efficiency, Absorption

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Proceedings Article | 5 March 2019 Presentation

LEE enhancement in AlGaN UVC LED using photonic crystal reflector fabricated on p-GaN contact layer (Conference Presentation)

Hideki Hirayama, Yukio Kashima, Yasuhiro Watanabe, Tomohiko Shibata, Noritoshi Maeda, Masafumi Jo, Eriko Matsuura, Takeshi Iwai, Mitsunori Kokubo, Takaharu Tashiro, Kanji Furuta, Ryuichiro Kamimura, Tamato Osada, Hideki Takagi, Yuuichi Kurashima, Yasushi Iwaisako, Tsugumu Nagano

Proceedings Volume 10918, 109181V (2019) https://doi.org/10.1117/12.2505751

KEYWORDS: Reflectors, Light emitting diodes, Resistance, External quantum efficiency, Absorption, Photonic crystals

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Proceedings Article | 30 March 2010 Paper

Characteristics of main chain decomposable star shaped polymer on EUV lithography

Taku Hirayama, Jun Iwashita, Sachiko Yoshizawa, Kenri Konno, Takeshi Iwai

Proceedings Volume 7639, 76390Q (2010) https://doi.org/10.1117/12.848439

KEYWORDS: Polymers, Stars, Lithography, Line width roughness, Polymer thin films, Extreme ultraviolet lithography, Diffusion, Semiconducting wafers, Nonlinear control, Lithographic illumination

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Proceedings Article | 1 April 2009 Paper

Main chain decomposible star shaped polymer for EUV resist

Jun Iwashita, Takeyoshi Mimura, Taku Hirayama, Takeshi Iwai

Proceedings Volume 7273, 72733O (2009) https://doi.org/10.1117/12.813990

KEYWORDS: Polymers, Stars, Diffusion, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Line width roughness, Polymerization, Semiconducting wafers, Polymer thin films

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Proceedings Article | 1 April 2009 Paper

Dissolution kinetics and deprotection reaction in chemically amplified resists upon exposure to extreme ultraviolet radiation

Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Takeyoshi Mimura, Takeshi Iwai, Junichi Onodera

Proceedings Volume 7273, 72731X (2009) https://doi.org/10.1117/12.814066

KEYWORDS: Polymers, Extreme ultraviolet lithography, Extreme ultraviolet, Absorption, Chemically amplified resists, Absorbance, Image processing, Silicon, Ultraviolet radiation, Line width roughness

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Proceedings Article | 1 April 2009 Paper

Topcoat-free ArF negative tone resist

Tomoyuki Ando, Sho Abe, Ryoichi Takasu, Jun Iwashita, Shogo Matsumaru, Ryoji Watanabe, Komei Hirahara, Yujiro Suzuki, Miki Tsukano, Takeshi Iwai

Proceedings Volume 7273, 727308 (2009) https://doi.org/10.1117/12.813787

KEYWORDS: Optical lithography, Lithography, Double patterning technology, Contamination, Scanners, Photomasks, Semiconducting wafers, Immersion lithography, Photoresist processing, Fluorine

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Proceedings Article | 4 December 2008 Paper

Pattern freezing process free litho-litho-etch double patterning

Tomoyuki Ando, Masaru Takeshita, Ryoich Takasu, Yasuhiro Yoshii, Jun Iwashita, Shogo Matsumaru, Sho Abe, Takeshi Iwai

Proceedings Volume 7140, 71402H (2008) https://doi.org/10.1117/12.804710

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Photomasks, Semiconducting wafers, Coating, Image processing, Line width roughness, Etching

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Proceedings Article | 26 March 2008 Paper

Resist development to improve flare issue of EUV lithography

Makiko Irie, Takako Suzuki, Takeyoshi Mimura, Takeshi Iwai

Proceedings Volume 6923, 692310 (2008) https://doi.org/10.1117/12.771120

KEYWORDS: Photomasks, Diffusion, Polymers, Extreme ultraviolet lithography, Polymer thin films, Manufacturing, Semiconducting wafers, Lithography, Light sources, Optical lithography

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Proceedings Article | 11 April 2006 Paper

Progress of topcoat and resist development for 193nm immersion lithography

Katsumi Ohmori, Tomoyuki Ando, Toshikazu Takayama, Keita Ishizuka, Masaki Yoshida, Yoshiyuki Utsumi, Kotaro Endo, Takeshi Iwai

Proceedings Volume 6153, 61531X (2006) https://doi.org/10.1117/12.656360

KEYWORDS: Polymers, Immersion lithography, Semiconducting wafers, Photoresist processing, Lithography, Silicon, Scanners, Coating, Manufacturing, 193nm lithography

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Proceedings Article | 29 March 2006 Paper

Changes of chemical nature of photoresists induced by various plasma treatments and their impact on LWR

Hiroichi Kawahira, Nobuyuki Matsuzawa, Eriko Matsui, Atsuhiro Ando, Kazi M. A. Salam, Masashi Yoshida, Yuko Yamaguchi, Katsuhisa Kugimiya, Tetsuya Tatsumi, Hiroyuki Nakano, Takeshi Iwai, Makiko Irie

Proceedings Volume 6153, 615319 (2006) https://doi.org/10.1117/12.656002

KEYWORDS: Line width roughness, Photoresist materials, Etching, Plasma, Plasma treatment, Chemical analysis, FT-IR spectroscopy, Polymers, Lithography, Semiconducting wafers

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Proceedings Article | 12 June 2003 Paper

Investigation of the polymer systems for ArF resists

Mitsuharu Yamana, Masumi Hirano, Seiji Nagahara, Kunihiko Kasama, Hideo Hada, Miwa Miyairi, Shinichi Kohno, Takeshi Iwai

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485105

KEYWORDS: Etching, Monochromatic aberrations, Polymers, Surface roughness, Resistance, Carbon, Lithography, Oxides, Photomasks, Chemical species

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Proceedings Article | 11 June 1999 Paper

Chemically amplified negative-tone resist using novel acryl polymer for 193-nm lithography

Hideo Hada, Takeshi Iwai, Toshimasa Nakayama

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350254

KEYWORDS: Polymers, Etching, Lithography, 193nm lithography, Scanning electron microscopy, Standards development, Optical lithography, Absorption, Catalysis, Photoresist materials

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Showing 5 of 12 publications

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