Dr. Takeshi Iwai
at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 5 March 2019
Proc. SPIE. 10918, Gallium Nitride Materials and Devices XIV
KEYWORDS: Reflectors, Light emitting diodes, External quantum efficiency, Resistance, Photonic crystals, Absorption

Proceedings Article | 30 March 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Stars, Lithographic illumination, Polymers, Diffusion, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films, Nonlinear control

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Optical lithography, Contamination, Scanners, Photomasks, Double patterning technology, Immersion lithography, Fluorine, Photoresist processing, Semiconducting wafers

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Stars, Polymers, Diffusion, Polymerization, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Polymer thin films

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Polymers, Image processing, Ultraviolet radiation, Silicon, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography, Absorption, Chemically amplified resists

Showing 5 of 11 publications
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