Dr. Takeshi Kato
Senior Engineer at Hitachi High-Technologies Corp
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Thin films, Lithography, Polymethylmethacrylate, Annealing, Directed self assembly, High volume manufacturing, Nanolithography, Thin film manufacturing, Resolution enhancement technologies, Temperature metrology

PROCEEDINGS ARTICLE | March 13, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Signal to noise ratio, Edge detection, Metrology, Detection and tracking algorithms, Reliability, Scanning electron microscopy, Process control, Image filtering, Critical dimension metrology, Line edge roughness

PROCEEDINGS ARTICLE | April 4, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Annealing, Line width roughness, Directed self assembly, Chemical analysis, Epitaxy, Line edge roughness, Edge roughness

SPIE Journal Paper | October 6, 2014
JM3 Vol. 13 Issue 04
KEYWORDS: Metrology, Overlay metrology, Calibration, Optical testing, Etching, Inspection, Scanning electron microscopy, Imaging metrology, Electron microscopes, Measurement devices

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Thin films, Edge detection, Metrology, Error analysis, Scanning electron microscopy, Directed self assembly, Critical dimension metrology, Signal detection, Polymer thin films, Edge roughness

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Etching, Process control, Finite element methods, Line width roughness, Directed self assembly, Chemical analysis, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Edge roughness

Showing 5 of 17 publications
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