Dr. Takeshi Koshiba
at Toshiba Corp
SPIE Involvement:
Author
Publications (11)

PROCEEDINGS ARTICLE | March 26, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Etching, Polymers, Molecules, Quantum efficiency, Resistance, Oxygen, Scanning electron microscopy, Line width roughness, Photoresist processing

SPIE Journal Paper | October 1, 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Critical dimension metrology, Point spread functions, Semiconducting wafers, Lithography, Photoresist processing, Semiconductors, Projection systems, Tungsten

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Point spread functions, Logic, Projection systems, Photomasks, Extreme ultraviolet lithography, Mask making, Critical dimension metrology, Semiconducting wafers, Electronic design automation

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Semiconductors, Lithography, Capillaries, Ultraviolet radiation, Diffusion, Nitrogen, Nanoimprint lithography, Line edge roughness, Photoresist processing, Ranging

PROCEEDINGS ARTICLE | December 1, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Manufacturing, Signal processing, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | March 26, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Thin films, Lithography, Microscopes, Electron beams, Molecules, Crystals, Silicon, Scanning electron microscopy, Solids, Line edge roughness

Showing 5 of 11 publications
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