Dr. Takeshi Shimoaoki
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | March 28, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Electron beam lithography, Defect detection, Modulation, Etching, Coating, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Stochastic processes

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Optical lithography, Contamination, Coating, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Semiconductors, Molecular bridges, Coating, Manufacturing, Finite element methods, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Standards development

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Image processing, Coating, Inspection, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Standards development, Plasma

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Contamination, Silica, Scanners, Particles, Critical dimension metrology, Thin film coatings, Photoresist processing, Semiconducting wafers, Particle contamination

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Etching, Particles, Manufacturing, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Standards development

Showing 5 of 15 publications
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