Takeshi Yamamoto
Student at Univ of Tokyo
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Spatial frequencies, Glasses, Surface roughness, Distortion, 3D modeling, Photomasks, Extreme ultraviolet lithography, Surface finishing, Standards development

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top