Takeshi Yamamoto
Student at Univ of Tokyo
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 18 March 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Spatial frequencies, Glasses, Surface roughness, Distortion, 3D modeling, Photomasks, Extreme ultraviolet lithography, Surface finishing, Standards development

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