Dr. Taku Hirayama
Manager at Tokyo Ohka Kogyo Co Ltd
SPIE Involvement:
Author
Publications (13)

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Polymers, Diffusion, Quantum efficiency, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Semiconducting wafers, Polymer thin films, Chemically amplified resists

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Optical lithography, Polymers, Image processing, Annealing, Error analysis, Coating, Materials processing, Manufacturing, Directed self assembly, Critical dimension metrology

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Environmental monitoring, Deep ultraviolet, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Aluminum, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Lithography, Lithographic illumination, Deep ultraviolet, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Absorption

PROCEEDINGS ARTICLE | March 20, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Thin films, Lithography, Polymers, Diffusion, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Photoresist processing, Semiconducting wafers, Polymer thin films

PROCEEDINGS ARTICLE | April 16, 2011
Proc. SPIE. 7972, Advances in Resist Materials and Processing Technology XXVIII
KEYWORDS: Lithography, Stars, Polymers, Diffusion, Image quality, Polymerization, Extreme ultraviolet lithography, Semiconducting wafers, Floods, Polymer thin films

Showing 5 of 13 publications
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