Mr. Takumi Ota
at Toshiba Corp
SPIE Involvement:
Author
Publications (7)

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Semiconductors, Lithography, Capillaries, Ultraviolet radiation, Diffusion, Nitrogen, Nanoimprint lithography, Line edge roughness, Photoresist processing, Ranging

PROCEEDINGS ARTICLE | December 1, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Optical lithography, Manufacturing, Signal processing, Photomasks, Extreme ultraviolet lithography, Double patterning technology, Nanoimprint lithography, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | March 14, 2008
Proc. SPIE. 6921, Emerging Lithographic Technologies XII
KEYWORDS: Lithography, Multilayers, Metals, Inspection, Nanoimprint lithography, Optical alignment, Line edge roughness, Semiconducting wafers, CMOS devices, Overlay metrology

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Electron beams, Polymethylmethacrylate, Scattering, Silicon, Computing systems, Scanning electron microscopy, Monte Carlo methods, 3D image processing, Virtual colonoscopy

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Lithography, Metals, Silicon, Distortion, Image analysis, Optical alignment, Signal detection, Overlay metrology, Virtual colonoscopy, Back end of line

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Electron beams, Amplifiers, Control systems, Photomasks, Beam shaping, Optical alignment, Data conversion, Electron beam direct write lithography, Semiconducting wafers, Vestigial sideband modulation

Showing 5 of 7 publications
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