Mr. Takuya Hagiwara Profile

Takuya Hagiwara

Researcher at Renesas Electronics Corp

SPIE Involvement:

Author

Publications (20)

Proceedings Article | 1 April 2009 Paper

Paper

Defect reduction in non-topcoat resist by selective segregation removal step

Takuya Hagiwara, Mamoru Terai, Takeo Ishibashi, Tomofumi Miyauchi, Shinya Hori, Teruhiko Kumada, Tomoya Kumagai, Atsushi Sawano, Kosuke Doi, Takeshi Matsunobe, Naoki Man, Hirofumi Seki, Yusaku Tanahashi, Tetsuro Hanawa

Proceedings Volume 7273, 727324 (2009) https://doi.org/10.1117/12.813643

KEYWORDS: Polymers, Photoresist processing, Semiconducting wafers, Lithography, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Scanners

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Proceedings Article | 19 May 2008 Paper

Paper

Application of super-diffraction-lithography (SDL) for advanced logic

Shuji Nakao, Shinroku Maejima, Yuko Mitarai, Takuya Hagiwara, Sachiko Ogawa, Tetsuro Hanawa, Kazuyuki Suko

Proceedings Volume 7028, 70283G (2008) https://doi.org/10.1117/12.793123

KEYWORDS: Photomasks, Critical dimension metrology, Photography, Resolution enhancement technologies, Printing, Immersion lithography, Logic, Transmittance, Scanning electron microscopy, Image processing

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Proceedings Article | 26 March 2008 Paper

Paper

Improvements of adhesion and hydrophobicity of wafer bevel in water immersion lithography

Takeo Ishibash, Mamoru Terai, Takuya Hagiwara, Teruhiko Kumada, Tetsuro Hanawa, Yoko Takebe, Osamu Yokokoji, Tomoharu Fujiwara, Hiroshi Akiyama

Proceedings Volume 6923, 69231V (2008) https://doi.org/10.1117/12.771794

KEYWORDS: Semiconducting wafers, Coating, Silicon, Head-mounted displays, Immersion lithography, Manufacturing, Fluorine, Particles, Calcium, Prototyping

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Proceedings Article | 7 March 2008 Paper

Paper

Double patterning using dual spin-on Si containing layers with multilayer hard mask process

Mamoru Terai, Takeo Ishibashi, Masaaki Shinohara, Kazumasa Yonekura, Takuya Hagiwara, Tetsuro Hanawa, Teruhiko Kumada

Proceedings Volume 6924, 692420 (2008) https://doi.org/10.1117/12.771855

KEYWORDS: Etching, Double patterning technology, Silicon, Optical lithography, Coating, Photomasks, FT-IR spectroscopy, Photoresist processing, Silica, Scanning electron microscopy

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Proceedings Article | 2 April 2007 Paper

Paper

Mechanism of immersion specific defects with high receding-angle topcoat

Mamoru Terai, Teruhiko Kumada, Takeo Ishibashi, Takuya Hagiwara, Tetsuro Hanawa, Tomoyuki Ando, Takeshi Matsunobe, Kazuyuki Okada, Yuichi Muraji, Kazuhiro Yoshikawa, Naoki Man

Proceedings Volume 6519, 65191S (2007) https://doi.org/10.1117/12.711058

KEYWORDS: Water, Bridges, Immersion lithography, Semiconducting wafers, Digital watermarking, Surface properties, Polymers, Chemical analysis, Defect inspection, Standards development

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Proceedings Article | 21 March 2006 Paper

Paper

Sub-40nm pattern fabrication in 157nm interferometric immersion lithography

Takuya Hagiwara, Shou Tsuji, Kiyoshi Fujii, Masato Moriya, Osamu Wakabayashi, Akira Sumitani, Yusuke Saito, Kazuhiko Maeda

Proceedings Volume 6154, 61544H (2006) https://doi.org/10.1117/12.656981

KEYWORDS: Refractive index, Liquids, Fluorine, Chemical species, Molecules, Interferometers, Prisms, Immersion lithography, Semiconducting wafers, Transparency

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Proceedings Article | 12 May 2005 Paper

Paper

Development and evaluation of an F2 laser for immersion interference lithography at 157nm

Yasuo Itakura, Youichi Kawasa, Osamu Wakabayashi, Masato Moriya, Shinji Nagai, Akira Sumitani, Takuya Hagiwara, Toshiyuki Ishimaru, Shou Tsuji, Kiyoshi Fujii, Wataru Wakamiya

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599512

KEYWORDS: Polarization, Interferometers, Lithography, Fluorine, Spatial coherence, Prisms, Immersion lithography, Fringe analysis, Laser resonators, Visibility

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Proceedings Article | 12 May 2005 Paper

Paper

Liquid immersion lithography at 157 nm

Takuya Hagiwara, Toshiyuki Ishimaru, Shou Tsuji, Kiyoshi Fujii, Yasuo Itakura, Osamu Wakabayashi, Youichi Kawasa, Keiji Egawa, Ikuo Uchino, Akira Sumitani, Yusuke Saito, Kazuhiko Maeda

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599379

KEYWORDS: Absorption, Transparency, Interferometry, Immersion lithography, Chemical species, Microfluidics, Refractive index, Fluorine, Semiconducting wafers, Glasses

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Proceedings Article | 12 May 2005 Paper

Paper

Status of 157 nm lithography and prospects for immersion

Kiyoshi Fujii, Takuya Hagiwara, Seiji Matsuura, Toshiyuki Ishimaru, Yoshihisa Matsubara, Wataru Wakamiya

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599455

KEYWORDS: Lithography, Immersion lithography, Refractive index, Absorption, Scanners, Lithographic illumination, Polarization, Optical lithography, Photomasks, Scanning electron microscopy

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Proceedings Article | 4 May 2005 Paper

Paper

Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography

T. Yamashita, T. Ishikawa, T. Yoshida, T. Hayamai, Takayuki Araki, H. Aoyama, T. Hagiwara, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599523

KEYWORDS: Polymers, Fluorine, Lithography, Immersion lithography, Transparency, Standards development, Quartz, Crystals, Photomasks, Polymerization

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Proceedings Article | 28 May 2004 Paper

Paper

157-nm chromeless phase lithography with extremely high numerical aperture

Kunio Watanabe, Takuya Hagiwara, Seiji Matsuura, Toshifumi Suganaga , Toshiro Itani , Kiyoshi Fujii

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535150

KEYWORDS: Lithography, Photomasks, Nanoimprint lithography, Lithographic illumination, Chromium, Quartz, Semiconducting wafers, Resolution enhancement technologies, Image resolution, Optical lithography

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Proceedings Article | 28 May 2004 Paper

Paper

157-nm chromeless phase lithography for 45-nm SRAM gate

Toshifumi Suganaga, Kunio Watanabe, Seiji Matsuura, Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534897

KEYWORDS: Resolution enhancement technologies, Photoresist processing, Transmittance, Semiconductors, Fabrication, Lithographic illumination, Line edge roughness, Photomasks, Lithography, Nanoimprint lithography

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Proceedings Article | 14 May 2004 Paper

Paper

Advances in resist pattern transfer process using 157-nm lithography

Takamitsu Furukawa, Takuya Hagiwara, Etsurou Kawaguchi, Kentaro Matsunaga, Toshifumi Suganaga, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535177

KEYWORDS: Reactive ion etching, Lithography, Photomasks, Photoresist processing, Etching, Binary data, Semiconductors, Optical lithography, Lithographic illumination, Line edge roughness

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Proceedings Article | 14 May 2004 Paper

Paper

The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials

Takuji Ishikawa, Tetsuhiro Kodani, Meiten Koh, Tsukasa Moriya, Takayuki Araki, Hirokazu Aoyama, Tsuneo Yamashita, Minoru Toriumi, Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533901

KEYWORDS: Polymers, Transparency, Lithography, Fluorine, Absorbance, Photomasks, Standards development, Phase shifts, Polymer thin films, Absorption

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Proceedings Article | 14 May 2004 Paper

Paper

Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography

Takuya Hagiwara, Takamitsu Furukawa, Toshiro Itani, Kiyoshi Fujii, Takuji Ishikawa, Meiten Koh, Tetsuhiro Kodani, Tsukasa Moriya, Tsuneo Yamashita, Takayuki Araki, Minoru Toriumi, Hirokazu Aoyama

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535098

KEYWORDS: Polymers, Absorption, Lithography, Resistance, Absorbance, Line edge roughness, Fluorine, Industrial chemicals, Transparency, Chlorine

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Proceedings Article | 26 June 2003 Paper

Paper

157-nm lithography for 65-nm node SRAM-gate

Toshifumi Suganaga, Shigeo Irie, Seiro Miyoshi, Jae-Hwan Kim, Kunio Watanabe, Eiji Kurose, Takamitsu Furukawa, Takuya Hagiwara, Toshiyuki Ishimaru, Toshiro Itani

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485376

KEYWORDS: Optical proximity correction, Lithography, Transmittance, Photoresist processing, Resolution enhancement technologies, Silicon, Reactive ion etching, Photomasks, Monochromatic aberrations, Optical simulations

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Proceedings Article | 12 June 2003 Paper

Paper

Dry-etching resistance of fluoropolymers for 157-nm single-layer resists

Yasuhide Kawaguchi, Jun Irisawa, Shun-ichi Kodama, Shinji Okada, Yoko Takebe, Isamu Kaneko, Osamu Yokokoji, Seiichi Ishikawa, Shigeo Irie, Takuya Hagiwara, Toshiro Itani

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483735

KEYWORDS: Polymers, Resistance, Etching, Chemical species, Fluorine, Transparency, Absorption, Lithography, Semiconducting wafers, Gases

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Proceedings Article | 30 July 2002 Paper

Paper

CD control in phase-edge lithography: the effects of lens aberration and pattern layout

Takuya Hagiwara, Katsuya Hayano, Akemi Moniwa, Hiroshi Fukuda

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474480

KEYWORDS: Critical dimension metrology, Optical proximity correction, Lithography, Photomasks, Optical lithography, Phase shifts, Image processing, Model-based design, Etching, Monochromatic aberrations

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Proceedings Article | 14 September 2001 Paper

Paper

Patterning of random interconnect using double exposure of strong-type PSMs

Hiroshi Fukuda, Takuya Hagiwara

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435767

KEYWORDS: Optical lithography, Double patterning technology, Optical proximity correction, Logic, Logic devices, Image quality, Printing, Phase shifts, Computer simulations, Feature extraction

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Proceedings Article | 14 September 2001 Paper

Paper

Impact of acid/quencher behavior on lithography performance

Hiroshi Fukuda, Keiko Hattori, Takuya Hagiwara

Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435732

KEYWORDS: Diffusion, Lithography, Photoresist processing, Performance modeling, Image processing, Optical proximity correction, Chemically amplified resists, Critical dimension metrology, Photomasks, Imaging spectroscopy

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Showing 5 of 20 publications

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