Mr. Takuya Ishii Profile

Takuya Ishii

at Gigaphoton Inc

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Author

Publications (7)

Proceedings Article | 10 April 2024 Poster + Paper

Development progress of Gigaphoton’s LPP EUV light source for inspection systems

Fumio Iwamoto, Yoshifumi Ueno, Shinji Nagai, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saito

Proceedings Volume 12953, 1295313 (2024) https://doi.org/10.1117/12.3010135

KEYWORDS: Extreme ultraviolet, Tin, Light sources, Inspection, Plasma, Collector mirrors, Plasma generation, Control systems, Laser irradiation, Reliability

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Proceedings Article | 21 November 2023 Poster + Paper

High-brightness and compact LPP EUV source for inspection system

Yasutsugu Usami, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Takuya Ishii, Tsuyoshi Yamada, Hiroaki Nakarai

Proceedings Volume 12751, 1275116 (2023) https://doi.org/10.1117/12.2686231

KEYWORDS: Extreme ultraviolet, Light sources, Inspection, Tin, Extreme ultraviolet lithography, Metrology, Plasma, Collector mirrors, Pellicles, Laser irradiation

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Proceedings Article | 21 November 2023 Poster + Paper

Development progress of Sn-LPP EUV light source for inspection systems

Yuichi Nishimura, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou

Proceedings Volume 12750, 127500V (2023) https://doi.org/10.1117/12.2686618

KEYWORDS: Extreme ultraviolet, Light sources, Inspection, Laser irradiation, Collector mirrors, Tin, Laser applications, Semiconductors, Reliability, Plasma

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Proceedings Article | 28 April 2023 Poster + Paper

Development progress of key components for LPP-EUV light sources

Hiroaki Tomuro, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 12494, 1249411 (2023) https://doi.org/10.1117/12.2657640

KEYWORDS: Extreme ultraviolet, Tin, Collector mirrors, Laser irradiation, Light sources, Plasma, Ions, Gas lasers, Hydrogen, Control systems

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Proceedings Article | 22 February 2021 Presentation

Latest ArF light source with speckle reduction technology for immersion lithography improving chip yield

Hirotaka Miyamoto, Takamitsu Komaki, Toshihiro Oga, Taku Yamazaki, Tsukasa Hori, Masato Moriya, Hiroshi Tanaka, Takuya Ishii, Akihiko Kurosu, Katsuhiko Wakana, Takeshi Ohta, Satoru Bushida, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 11613, 116130D (2021) https://doi.org/10.1117/12.2583281

KEYWORDS: Light sources, Speckle, Yield improvement, Extreme ultraviolet lithography, Immersion lithography, Spatial coherence, Temporal coherence, Line width roughness, Optical lithography, Lithography

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Proceedings Article | 19 March 2018 Paper

Key components development progress updates of the 250W high-power LPP-EUV light source

Yoshifumi Ueno, Tsukasa Hori, Yasufumi Kawasuji, Yutaka Shiraishi, Tatsuya Yanagida, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Yukio Watanabe, Takeshi Okamoto, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saitou, Hakaru Mizoguchi

Proceedings Volume 10583, 1058328 (2018) https://doi.org/10.1117/12.2283066

KEYWORDS: Gas lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Magnetism, Pulsed laser operation

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Proceedings Article | 16 October 2017 Paper

Key components development progress updates of the 250W high power LPP-EUV light source

Takayuki Yabu, Yasufumi Kawasuji, Tsukasa Hori, Takeshi Okamoto, Hiroshi Tanaka, Kenichi Miyao, Takuya Ishii, Yukio Watanabe, Tatsuya Yanagida, Yutaka Shiraishi, Tamotsu Abe, Takeshi Kodama, Hiroaki Nakarai, Taku Yamazaki, Noritoshi Itou, Takashi Saito, Hakaru Mizoguchi

Proceedings Volume 10450, 104501C (2017) https://doi.org/10.1117/12.2280503

KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Mirrors, Light sources, Magnetism, Solid state lasers, Control systems, Laser stabilization

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Showing 5 of 7 publications

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