Mr. Takuya Kono
Group Manager at Toshiba Memory Corp
SPIE Involvement:
Author
Publications (24)

PROCEEDINGS ARTICLE | May 2, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Particles, Distortion, Extreme ultraviolet lithography, Nanoimprint lithography, Optical alignment, Photoresist processing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 23, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Nanotechnology, Lithography, Etching, Manufacturing, Process control, Photomasks, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Photoresist processing

PROCEEDINGS ARTICLE | March 21, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Ultraviolet radiation, Interfaces, Diffusion, Nanoimprint lithography, Photoresist processing, Liquids

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Design for manufacturing, Source mask optimization, Optical proximity correction, High volume manufacturing, Nanoimprint lithography, Photoresist processing, Process modeling

PROCEEDINGS ARTICLE | April 3, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Error analysis, Silicon, Distortion, Process control, Semiconductor manufacturing, Nanoimprint lithography, Optical alignment, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 31, 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Nanotechnology, Lithography, Optical microscopes, Optical lithography, Ultraviolet radiation, Design for manufacturing, Artificial intelligence, Double patterning technology, Nanoimprint lithography, Photoresist processing, Scatter measurement, Nanolithography, UV optics, Design for manufacturability

Showing 5 of 24 publications
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