Tal Itzkovich
Application Development Engineer at Applied Materials Israel Ltd
SPIE Involvement:
Publications (17)

Proceedings Article | 30 April 2023 Poster
Proceedings Volume 12496, 1249623 (2023) https://doi.org/10.1117/12.2669984
KEYWORDS: Overlay metrology, Scanning electron microscopy, Design and modelling, Metrology, Semiconducting wafers, Visibility, Shrinkage, Optical metrology, Design rules, Calibration

Proceedings Article | 7 May 2019 Presentation + Paper
Proceedings Volume 10959, 109591S (2019) https://doi.org/10.1117/12.2514877
KEYWORDS: Stochastic processes, Metrology, Inspection, Scanning electron microscopy, Critical dimension metrology, Extreme ultraviolet, Error analysis, Defect inspection, Defect detection, Lithography

Proceedings Article | 22 March 2018 Presentation + Paper
Guido Rademaker, Jonathan Pradelles, Stéfan Landis, Stephane Rey, Anna Golotsvan, Anat Marchelli, Tal Itzkovich, Tetyana Shapoval, Ronny Haupt, Erwin Slot, Guido de Boer, Dhara Dave, Marco Wieland, Laurent Pain
Proceedings Volume 10585, 105850U (2018) https://doi.org/10.1117/12.2297535
KEYWORDS: Overlay metrology, Metrology, Electron beam lithography, Lenses, Distance measurement, Electron beams, Raster graphics, Semiconducting wafers, Time metrology, Process control

Proceedings Article | 30 March 2017 Paper
Joonseuk Lee, Mirim Jung, Honggoo Lee, Youngsik Kim, Sangjun Han, Michael Adel, Tal Itzkovich, Vladimir Levinski, Victoria Naipak, Anna Golotsvan, Amnon Manassen, Yuri Paskover, Tom Leviant, Efi Megged, Myungjun Lee, Mark Smith, Do-Hwa Lee, DongSub Choi, Zephyr Liu
Proceedings Volume 10145, 1014524 (2017) https://doi.org/10.1117/12.2258376
KEYWORDS: Overlay metrology, Metrology, Lithography, Manufacturing, Semiconducting wafers, Optical lithography, Polarization, Modulation, Critical dimension metrology, Image segmentation

Proceedings Article | 28 March 2017 Presentation + Paper
F. Dettoni, T. Shapoval, R. Bouyssou, T. Itzkovich, R. Haupt, C. Dezauzier
Proceedings Volume 10145, 101450C (2017) https://doi.org/10.1117/12.2257883
KEYWORDS: Semiconductor manufacturing, Manufacturing, Overlay metrology, Metrology, Semiconductors, Process control, CMOS technology, Lithography, Yield improvement, Chemical mechanical planarization, Semiconducting wafers, Etching, Optical filters, Optical properties, Opacity, Critical dimension metrology

Showing 5 of 17 publications
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