Ms. Tal Itzkovich
at KLA-Tencor Israel
SPIE Involvement:
Author
Publications (14)

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Modulation, Polarization, Image segmentation, Manufacturing, Critical dimension metrology, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Optical filters, Metrology, Optical properties, Opacity, Etching, Manufacturing, Process control, Semiconductor manufacturing, CMOS technology, Critical dimension metrology, Semiconducting wafers, Yield improvement, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Overlay metrology, Personal protective equipment, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 24, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Photovoltaics, Metrology, Diffractive optical elements, Detection and tracking algorithms, Optical properties, Etching, Scatterometry, Signal processing, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Neodymium, Overlay metrology, Personal protective equipment

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Lithography, Metrology, Quality measurement, Scatterometry, Uncertainty analysis, Signal processing, Process control, Photomasks, Double patterning technology, Overlay metrology

Showing 5 of 14 publications
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