Tal Itzkovich
Application Development Engineer at Applied Materials
SPIE Involvement:
Author
Publications (16)

Proceedings Article | 7 May 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Lithography, Metrology, Defect detection, Error analysis, Inspection, Scanning electron microscopy, Extreme ultraviolet, Critical dimension metrology, Stochastic processes, Defect inspection

Proceedings Article | 22 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Electron beam lithography, Electron beams, Metrology, Lenses, Time metrology, Distance measurement, Process control, Raster graphics, Semiconducting wafers, Overlay metrology

Proceedings Article | 30 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Lithography, Metrology, Optical lithography, Modulation, Polarization, Image segmentation, Manufacturing, Critical dimension metrology, Semiconducting wafers, Overlay metrology

Proceedings Article | 28 March 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Semiconductors, Lithography, Optical filters, Metrology, Optical properties, Opacity, Etching, Manufacturing, Process control, Semiconductor manufacturing, CMOS technology, Critical dimension metrology, Semiconducting wafers, Yield improvement, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Lithography, Metrology, Optical lithography, Lithographic illumination, Scanners, Photomasks, Optical proximity correction, SRAF, Overlay metrology, Personal protective equipment, Resolution enhancement technologies

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Photovoltaics, Metrology, Diffractive optical elements, Detection and tracking algorithms, Optical properties, Etching, Scatterometry, Signal processing, Semiconducting wafers, Overlay metrology

Showing 5 of 16 publications
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