Dr. Tal Marciano
at KLA Israel
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Wafer-level optics, Metrology, Diffractive optical elements, Imaging systems, Manufacturing, Quality measurement, Scanning electron microscopy, Scatterometry, Semiconducting wafers, Overlay metrology

Proceedings Article | 13 March 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Diffraction, Visible radiation, Light sources, Imaging technologies, Optical testing, Signal processing, Integrated circuits, Semiconducting wafers, Electromagnetism, Overlay metrology

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Photovoltaics, Metrology, Diffractive optical elements, Detection and tracking algorithms, Optical properties, Etching, Scatterometry, Signal processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 24 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Semiconductors, Diffraction, Metrology, Image processing, Manufacturing, Physics, Scatterometry, Optical metrology, Signal processing, Process control, Semiconductor manufacturing, Optical alignment, Neodymium, Semiconducting wafers, Optics manufacturing, Overlay metrology, Accuracy assessment

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