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Tamer Desouky
at GlobalFoundries
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Publications (1)
Proceedings Article | 16 October 2017 Paper
Aerial image ORC checks and their correlation to wafer-edge yield limitation for metals: a study and an OPC resolution
Tamer Desouky, Yixiao Zhang, Mark Terry, Haizhou Yin, Muhammed Pallachali, Nicolai Petrov, Teck Jung Tang, Fadi Batarseh, Ahmed Khalil, Pietro Babighian, Rohan Deshpande, Deborah Ryan, Rao Desineni, Shweta Shokale, Feng Wang, Sang-Kee Eah, Jiechang Hou
Proceedings Volume 10451, 104511L (2017) https://doi.org/10.1117/12.2280568
KEYWORDS: Optical proximity correction, Semiconducting wafers, Silicon, Metals, Design for manufacturing, Scanning electron microscopy, Lithography
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