Mr. Tamer S. Desouky Profile

Tamer S. Desouky

Senior RET Consultant at Siemens EDA

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Author

Publications (8)

Proceedings Article | 8 November 2012 Paper

Double patterning for 20nm and beyond: design rules aware splitting

Tamer Desouky, David Abercrombie, Hojun Kim, Soo-Han Choi

Proceedings Volume 8522, 852221 (2012) https://doi.org/10.1117/12.946589

KEYWORDS: Double patterning technology, Optical lithography, Visualization, Acquisition tracking and pointing, Photomasks, Legal, Lithography, Lab on a chip, Electronic design automation, Detection and tracking algorithms

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Proceedings Article | 13 March 2012 Paper

A hybrid model/pattern based OPC approach for improved consistency and TAT

Tamer Desouky

Proceedings Volume 8326, 832626 (2012) https://doi.org/10.1117/12.914696

KEYWORDS: Optical proximity correction, Computer simulations, Tolerancing, Photomasks, Transistors, Lithography, Phase modulation, Visualization, Resolution enhancement technologies, Optical lithography

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Proceedings Article | 13 March 2012 Paper

Integration of pattern matching into verification flows

Tamer Desouky, Omnia Saeed

Proceedings Volume 8326, 83261X (2012) https://doi.org/10.1117/12.915267

KEYWORDS: Optical proximity correction, Error analysis, Silicon, Databases, Phase modulation, Tolerancing, Standards development, Model-based design, Electronic design automation, Visualization

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Proceedings Article | 23 May 2011 Paper

Evaluation of process variations on OPC model predictions

James Oberschmidt, Samit Barai, Tamer Desouky, Om Prakash Jaiswal, Aditya Padmawar, Ramana Murthy Pusuluri

Proceedings Volume 8081, 80810O (2011) https://doi.org/10.1117/12.897531

KEYWORDS: Photomasks, Data modeling, Calibration, Critical dimension metrology, Optical proximity correction, Process modeling, Semiconducting wafers, Lithography, Polarization, Wafer-level optics

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Proceedings Article | 19 May 2011 Paper

Elimination of lithographic hotspots which have been waived by means of pattern matching

Aditya Chaudhary, Pierre Bouchard, Kalpesh Dave, Tamer Desouky, Karim Moamen, Mark Simmons

Proceedings Volume 8081, 80810S (2011) https://doi.org/10.1117/12.897527

KEYWORDS: Databases, Optical proximity correction, Lithography, Semiconducting wafers, Silicon, Photomasks, Scanning electron microscopy, Visualization, Optical lithography, Nonlinear optics

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Proceedings Article | 25 September 2010 Paper

OPC recipe optimization using simulated annealing

Tamer Desouky

Proceedings Volume 7823, 78233N (2010) https://doi.org/10.1117/12.864214

KEYWORDS: Optical proximity correction, Algorithms, Annealing, Optimization (mathematics), Resolution enhancement technologies, Genetic algorithms, Crystals, Photomasks, Electronic circuits, Liquids

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Proceedings Article | 4 March 2010 Paper

Automation of sample plan creation for process model calibration

James Oberschmidt, Amr Abdo, Tamer Desouky, Mohamed Al-Imam, Azalia Krasnoperova, Ramya Viswanathan

Proceedings Volume 7640, 76401G (2010) https://doi.org/10.1117/12.846276

KEYWORDS: Calibration, Process modeling, Statistical modeling, Data modeling, Photoresist processing, Lithography, Computer simulations, Image processing, Metrology, Optical proximity correction

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Proceedings Article | 17 October 2008 Paper

Convergence-based OPC method for dense simulations

Tamer Desouky

Proceedings Volume 7122, 71221M (2008) https://doi.org/10.1117/12.801431

KEYWORDS: Optical proximity correction, Tolerancing, Computer simulations, Metals, Error analysis, Active optics, Optical calibration, Device simulation, Photomasks, Printing

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Showing 5 of 8 publications

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