Tamer S. Desouky
Senior RET Consultant at Mentor Graphics Egypt
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Lithography, Optical lithography, Detection and tracking algorithms, Visualization, Legal, Lab on a chip, Photomasks, Acquisition tracking and pointing, Double patterning technology, Electronic design automation

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Lithography, Optical lithography, Phase modulation, Visualization, Computer simulations, Photomasks, Transistors, Optical proximity correction, Tolerancing, Resolution enhancement technologies

Proceedings Article | 13 March 2012
Proc. SPIE. 8326, Optical Microlithography XXV
KEYWORDS: Phase modulation, Visualization, Databases, Error analysis, Silicon, Optical proximity correction, Tolerancing, Electronic design automation, Model-based design, Standards development

Proceedings Article | 23 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Polarization, Calibration, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Process modeling

Proceedings Article | 19 May 2011
Proc. SPIE. 8081, Photomask and Next-Generation Lithography Mask Technology XVIII
KEYWORDS: Lithography, Optical lithography, Visualization, Databases, Silicon, Scanning electron microscopy, Nonlinear optics, Photomasks, Optical proximity correction, Semiconducting wafers

Showing 5 of 8 publications
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