Dr. Tamer T. Elazhary
Senior Design Engineer at ASML
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | October 14, 2010
Proc. SPIE. 7826, Sensors, Systems, and Next-Generation Satellites XIV
KEYWORDS: Signal to noise ratio, Cameras, Sensors, Satellites, Remote sensing, Image resolution, Ocean optics, Satellite imaging, Satellite communications, Modulation transfer functions

PROCEEDINGS ARTICLE | March 10, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Data modeling, Calibration, Data processing, Finite element methods, Optical proximity correction, Critical dimension metrology, Photoresist processing, Optical calibration, Process modeling, Instrument modeling

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Photovoltaics, Statistical analysis, Visualization, Etching, Photomasks, Optical proximity correction, SRAF, Photoresist processing, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Thin films, Diffraction, Optical lithography, Calibration, Optical simulations, Optical proximity correction, Critical dimension metrology, Process modeling, Beam analyzers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 16, 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Diffraction, Optical lithography, Scattering, Error analysis, Image analysis, Photomasks, Critical dimension metrology, Panoramic photography, Resolution enhancement technologies, Fiber optic illuminators

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Signal attenuation, Image processing, Silicon, Manufacturing, Computer simulations, Photomasks, Optical simulations, Optical proximity correction, SRAF, Semiconducting wafers

Showing 5 of 8 publications
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