Tamotsu Abe
at Gigaphoton Inc
SPIE Involvement:
Author
Publications (49)

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Mirrors, Light sources, Laser development, Reflectivity, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Proceedings Article | 23 March 2020
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI
KEYWORDS: Mirrors, Light sources, Magnetism, Control systems, Gas lasers, Extreme ultraviolet, Carbon monoxide, Pulsed laser operation, Plasma, Tin

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Light sources, Extreme ultraviolet

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Semiconductors, Mirrors, Reflectivity

Proceedings Article | 6 June 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Mirrors, Light sources, Ions, Laser development, Carbon dioxide lasers, Magnetism, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

Showing 5 of 49 publications
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