Tamotsu Abe
at Gigaphoton Inc
SPIE Involvement:
Author
Publications (42)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Mirrors, Extreme ultraviolet, Carbon dioxide lasers, Semiconductor manufacturing, Semiconductors, High volume manufacturing, Light sources, Extreme ultraviolet lithography, Magnetism, Lithography

PROCEEDINGS ARTICLE | October 3, 2018
Proc. SPIE. 10809, International Conference on Extreme Ultraviolet Lithography 2018
KEYWORDS: Extreme ultraviolet, Tin, Gas lasers, Magnetism, Light sources, Mirrors, Plasma, Picosecond phenomena, Semiconductors

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10583, Extreme Ultraviolet (EUV) Lithography IX
KEYWORDS: Gas lasers, Extreme ultraviolet, Tin, Light sources, Plasma, Magnetism, Pulsed laser operation

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Carbon dioxide lasers, Extreme ultraviolet, Tin, Pulsed laser operation, Mirrors, Light sources, Magnetism, Solid state lasers, Control systems, Laser stabilization

PROCEEDINGS ARTICLE | October 16, 2017
Proc. SPIE. 10450, International Conference on Extreme Ultraviolet Lithography 2017
KEYWORDS: Extreme ultraviolet, Gas lasers, Mirrors, Tin, Carbon monoxide, Light sources, Plasma, Magnetism, Laser development, Extreme ultraviolet lithography

Showing 5 of 42 publications
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