Tatsuro Nagahara
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | May 5, 2017
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Electron beam lithography, Capillaries, Manufacturing, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, High volume manufacturing, Photoresist processing

PROCEEDINGS ARTICLE | April 1, 2016
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Polymers, Image processing, Inspection, Surface roughness, Line width roughness, Chemical reactions, Scanning probe microscopy, Photoresist processing, 3D image processing

PROCEEDINGS ARTICLE | March 20, 2015
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Polymers, Diffusion, Materials processing, Manufacturing, Scanning electron microscopy, Integrated circuits, Cadmium sulfide, Semiconducting wafers, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 13, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Polymers, Image processing, Chemistry, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Thin film coatings, Photoresist processing, Edge roughness

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Lithography, Image processing, Materials processing, Photoresist materials, Thermal effects, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Floods, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Optical lithography, Deep ultraviolet, Image processing, Materials processing, Photoresist processing, Semiconducting wafers, Yield improvement, 193nm lithography, Resolution enhancement technologies

Showing 5 of 10 publications
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