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Tatsuro Okawa
manager at Advantest Corp
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Publications (4)
Proceedings Article | 21 November 2023 Presentation + Paper
Optimizing CD-SEM metrology for anamorphic high-NA EUV photomasks
Deepan Kishore Kumar, Varun Mohan, Hatsey Frezghi, Adam Seeger, Malahat Tavassoli, Masayuki Kuribara, Kiyoshi Oura, Wataru Ito, Soichi Shida, Tatsuro Okawa, Mark Sheppard, Toshimichi Iwai
Proceedings Volume 12751, 127510R (2023) https://doi.org/10.1117/12.2687660
KEYWORDS: Metrology, Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Photomasks, Optical proximity correction, Reticles
Proceedings Article | 5 October 2023 Paper
High-performance computing architecture (HW/SW) for mask CDSEM design based metrology
Tatsuro Okawa, Yusuke Kakinuma, Yoshiaki Ogiso, Naoyuki Tanaka, Kazuo Mukawa, Soichi Shida, Shinichi Kojima, Toshimichi Iwai
Proceedings Volume 12802, 128020D (2023) https://doi.org/10.1117/12.2675545
KEYWORDS: Image processing, Metrology, Design and modelling, Computer hardware, Image processing software, Scanning electron microscopy, Contour extraction, Parallel processing, Computing systems, Lithography
Proceedings Article | 25 May 2010 Paper
Evaluation of throughput improvement and character projection in multi-column-cell E-beam exposure system
Akio Yamada, Yoshihisa Oae, Tatsuro Okawa, Masahiro Takizawa, Masaki Yamabe
Proceedings Volume 7748, 774816 (2010) https://doi.org/10.1117/12.864286
KEYWORDS: Photomasks, Logic devices, Beam shaping, Vestigial sideband modulation, Optical proximity correction, Power supplies, Analytical research, Analog electronics, Semiconducting wafers, Logic
Proceedings Article | 11 March 2010 Paper
Evaluation of throughput improvement by MCC and CP in multicolumn e-beam exposure system
Akio Yamada, Yoshihisa Oae, Tatsuro Okawa, Masahiro Takizawa, Masaki Yamabe
Proceedings Volume 7637, 76370C (2010) https://doi.org/10.1117/12.846464
KEYWORDS: Photomasks, Beam shaping, Vestigial sideband modulation, Power supplies, Semiconducting wafers, Analog electronics, Analytical research, Lenses, Silicon, Calibration
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