Tatsuya Aihara
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 17 October 2008 Paper
Toshi Iwai, Soichi Shida, Mitsuo Hiroyama, Takayuki Nakamura, Hisaya Sakaguchi, Hiroki Ueno, Masaru Higuchi, Tatsuya Aihara
Proceedings Volume 7122, 71222R (2008) https://doi.org/10.1117/12.801418
KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Electron beams, Metrology, Electron microscopes, Process control, OLE for process control, Image resolution, Beam controllers

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71222S (2008) https://doi.org/10.1117/12.801994
KEYWORDS: Photomasks, Semiconducting wafers, Critical dimension metrology, Metrology, Scanning electron microscopy, Optical proximity correction, Lithography, Opacity, Printing, Double patterning technology

Proceedings Article | 19 May 2008 Paper
Tastuya Aihara, Shinpei Kondo, Masaru Higuchi
Proceedings Volume 7028, 70281N (2008) https://doi.org/10.1117/12.793064
KEYWORDS: Critical dimension metrology, Optical proximity correction, Line scan image sensors, Photomasks, Image quality, Metrology, Line edge roughness, Distance measurement, Printing, Lithography

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