Tatsuya Aihara
at Toppan Printing Co Ltd
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Lithography, Metrology, Opacity, Scanning electron microscopy, Printing, Photomasks, Double patterning technology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Electron beams, Metrology, Image resolution, Electron microscopes, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology, Beam controllers, OLE for process control

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Metrology, Printing, Image quality, Distance measurement, Photomasks, Optical proximity correction, Critical dimension metrology, Line edge roughness, Line scan image sensors

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