Tatsuya Hayashi
at Canon Inc
SPIE Involvement:
Publications (9)

Proceedings Article | 23 March 2020 Paper
Atsushi Kimura, Takehiko Iwanaga, Yukio Takabayashi, Mitsuru Hiura, Keita Sakai, Hiroshi Morohoshi, Toshiya Asano, Takamitsu Komaki, Tatsuya Hayashi
Proceedings Volume 11324, 113240B (2020) https://doi.org/10.1117/12.2551985
KEYWORDS: Nanoimprint lithography, Semiconducting wafers, Optical alignment, Photomasks, Distortion, Overlay metrology, Optical lithography, Wafer testing, Lithography, Semiconductor manufacturing

Proceedings Article | 27 June 2019 Paper
Proceedings Volume 11178, 111780J (2019) https://doi.org/10.1117/12.2536315
KEYWORDS: Semiconducting wafers, Distortion, Nanoimprint lithography, Overlay metrology, Photomasks, Wafer testing, Optical alignment, Source mask optimization, Lithography, Optical lithography

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10958, 109580B (2019) https://doi.org/10.1117/12.2514924
KEYWORDS: Semiconducting wafers, Optical alignment, Wafer testing, Nanoimprint lithography, Distortion, Overlay metrology, Photomasks, Source mask optimization, Optical lithography, Lithography

Proceedings Article | 19 March 2018 Paper
Mitsuru Hiura, Tatsuya Hayashi, Atsushi Kimura, Yoshio Suzaki
Proceedings Volume 10584, 105840U (2018) https://doi.org/10.1117/12.2299644
KEYWORDS: Photomasks, Semiconducting wafers, Nanoimprint lithography, Particles, Distortion, Overlay metrology, Optical lithography, Source mask optimization, High volume manufacturing, Actuators

Proceedings Article | 16 October 2017 Paper
Mitsuru Hiura, Tatsuya Hayashi, Atsushi Kimura, Yoshio Suzaki, Kohei Imoto, Jin Choi, Hiroshi Morohoshi
Proceedings Volume 10451, 104511B (2017) https://doi.org/10.1117/12.2280440
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Overlay metrology, Nanoimprint lithography, Particles, Semiconductors, Distortion, Semiconductor manufacturing, Capillaries

Showing 5 of 9 publications
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