Tatsuya Maeda
GM at Hitachi High-Tech Taiwan Corp
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Semiconductors, Lithography, Metrology, Cadmium, Etching, Image processing, Photoresist materials, Double patterning technology, Critical dimension metrology, Algorithm development

Proceedings Article | 30 September 2009 Paper
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Metrology, Data modeling, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, System integration, Semiconducting wafers, Binary data

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Lithography, Metrology, Data modeling, Manufacturing, Scanning electron microscopy, Photomasks, Optical proximity correction, Critical dimension metrology, System integration, Semiconducting wafers

Proceedings Article | 24 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Semiconductors, Electron beams, Metrology, Contamination, Image resolution, Electron microscopes, Scanning electron microscopy, Optical alignment, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 23 March 2009 Paper
Proc. SPIE. 7272, Metrology, Inspection, and Process Control for Microlithography XXIII
KEYWORDS: Monochromatic aberrations, Electron beams, Metrology, Contamination, Visualization, Image processing, Image resolution, Scanning electron microscopy, Convolution, Critical dimension metrology

Showing 5 of 11 publications
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