Ted G. Doros
Principal Lithography Engineer at
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | June 23, 2000
Proc. SPIE. 3999, Advances in Resist Technology and Processing XVII
KEYWORDS: Deep ultraviolet, Ions, Silicon, Photoresist materials, Photomasks, Boron, Transistors, Semiconducting wafers, Arsenic, Plasma

PROCEEDINGS ARTICLE | June 2, 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Lithography, Optical lithography, Contamination, Etching, Particles, Copper, Corrosion, Tantalum, Semiconducting wafers, Chemical mechanical planarization

PROCEEDINGS ARTICLE | July 26, 1999
Proc. SPIE. 3679, Optical Microlithography XII
KEYWORDS: Monochromatic aberrations, Point spread functions, Deep ultraviolet, Scanners, Distortion, Image quality, Optical aberrations, Optics manufacturing, Overlay metrology, Phase shifts

PROCEEDINGS ARTICLE | June 14, 1999
Proc. SPIE. 3677, Metrology, Inspection, and Process Control for Microlithography XIII
KEYWORDS: Oxides, Polymers, Metals, Copper, Signal processing, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

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