Dr. Thaddeus Dziura
Principal Research Scientist at KLA-Tencor
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Polymethylmethacrylate, Etching, Silicon, Inspection, Scanning electron microscopy, Scatterometry, Directed self assembly, Critical dimension metrology, Semiconducting wafers, Single crystal X-ray diffraction

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Polymethylmethacrylate, Data modeling, Scatterometry, Bridges, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Line edge roughness, Semiconducting wafers

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Semiconductors, Metrology, Data modeling, Metals, Silicon, Transmission electron microscopy, Scatterometry, Critical dimension metrology, Semiconducting wafers, Back end of line

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Oxides, Metrology, Data modeling, Metals, Dielectrics, Silicon, Scatterometry, Semiconducting wafers, Tin, Fin field effect transitor

PROCEEDINGS ARTICLE | March 24, 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Metrology, Optical lithography, Etching, Spectroscopy, Reflectometry, Process control, Double patterning technology, Critical dimension metrology, Performance modeling, Systems modeling

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Lithography, Metrology, Data modeling, Scatterometry, Process control, Finite element methods, Photoresist processing, Semiconducting wafers, Scatter measurement, Single crystal X-ray diffraction

Showing 5 of 17 publications
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