Dr. Ted Liang
Principal Engineer at Intel Corp.
SPIE Involvement:
Conference Program Committee | Author
Publications (36)

SPIE Journal Paper | December 27, 2017
JM3 Vol. 16 Issue 04
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Optical lithography, Pellicles, Inspection, Optical proximity correction, Free electron lasers, Printing, Scanners

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Reticles, Optical lithography, Scanners, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Yield improvement

PROCEEDINGS ARTICLE | November 11, 2015
Proc. SPIE. 9635, Photomask Technology 2015
KEYWORDS: Deep ultraviolet, Scanners, Particles, Inspection, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

PROCEEDINGS ARTICLE | March 16, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Signal to noise ratio, Microscopes, Apodization, Phase contrast, Defect detection, Inspection, Interference (communication), Extreme ultraviolet, Phase shifts, Absorption

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Electron beams, Etching, Nickel, Ions, Transmission electron microscopy, Monte Carlo methods, Extreme ultraviolet, Helium, Neon, Ruthenium

PROCEEDINGS ARTICLE | March 20, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Lithography, Metrology, Optical lithography, Scanning electron microscopy, Photoresist materials, Photomasks, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers

Showing 5 of 36 publications
Conference Committee Involvement (10)
Extreme Ultraviolet (EUV) Lithography X
25 February 2019 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IX
26 February 2018 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VIII
27 February 2017 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VII
22 February 2016 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography VI
23 February 2015 | San Jose, California, United States
Showing 5 of 10 published special sections
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top