Dr. Tero S. Kulmala
Applications Engineer at SwissLitho AG
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Polymers, Capillaries, Nickel, Photoresist materials, Extreme ultraviolet, Integrated circuits, Extreme ultraviolet lithography, High volume manufacturing, Photoresist processing, Semiconducting wafers, Electroplating, Photoresist developing, Liquids

SPIE Journal Paper | December 24, 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Palladium, Platinum, Magnesium, Extreme ultraviolet, Solids, Metals, Lithography, Extreme ultraviolet lithography, Carbon monoxide, Carbonates

SPIE Journal Paper | August 7, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Photomasks, Scanning electron microscopy, Lithography, Diffraction, Diffraction gratings, Optical lithography

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Optical lithography, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Liquids, Chemically amplified resists

PROCEEDINGS ARTICLE | March 3, 2014
Proc. SPIE. 8966, Vertical External Cavity Surface Emitting Lasers (VECSELs) IV
KEYWORDS: Ultrafast phenomena, Mirrors, Silica, Graphene, Mode locking, Dielectrics, Semiconductor lasers, Wavelength tuning, Pulsed laser operation, Absorption

PROCEEDINGS ARTICLE | March 3, 2014
Proc. SPIE. 8966, Vertical External Cavity Surface Emitting Lasers (VECSELs) IV
KEYWORDS: Semiconductors, Refractive index, Mirrors, Silica, Graphene, Mode locking, Interfaces, Reflectivity, Semiconductor lasers, Absorption

Showing 5 of 6 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top