Dr. Tero S. Kulmala
Principal Applications Engineer at SwissLitho Ag
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 19, 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Holograms, Etching, Polymers, Silicon, Scanning probe lithography, Atomic force microscopy, Nanoimprint lithography, Reactive ion etching, Photoresist processing

PROCEEDINGS ARTICLE | April 28, 2017
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Polymethylmethacrylate, Scattering, X-rays, Laser scattering, Nondestructive evaluation, Photoresist materials, Dimensional metrology, Extreme ultraviolet, Critical dimension metrology, Systems modeling

PROCEEDINGS ARTICLE | March 18, 2016
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Polymers, Capillaries, Nickel, Photoresist materials, Extreme ultraviolet, Integrated circuits, Extreme ultraviolet lithography, High volume manufacturing, Photoresist processing, Semiconducting wafers, Electroplating, Photoresist developing, Liquids

SPIE Journal Paper | December 24, 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Palladium, Platinum, Magnesium, Extreme ultraviolet, Solids, Metals, Lithography, Extreme ultraviolet lithography, Carbon monoxide, Carbonates

SPIE Journal Paper | August 7, 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Photomasks, Scanning electron microscopy, Lithography, Diffraction, Diffraction gratings, Optical lithography

PROCEEDINGS ARTICLE | April 6, 2015
Proc. SPIE. 9422, Extreme Ultraviolet (EUV) Lithography VI
KEYWORDS: Lithography, Optical lithography, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Liquids, Chemically amplified resists

Showing 5 of 8 publications
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