Dr. Tero S. Kulmala
Principal Applications Engineer at SwissLitho Ag
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 19 March 2018 Paper
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Holograms, Etching, Polymers, Silicon, Scanning probe lithography, Atomic force microscopy, Nanoimprint lithography, Reactive ion etching, Photoresist processing

Proceedings Article | 28 April 2017 Presentation
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Polymethylmethacrylate, Scattering, X-rays, Laser scattering, Nondestructive evaluation, Photoresist materials, Dimensional metrology, Extreme ultraviolet, Critical dimension metrology, Systems modeling

Proceedings Article | 18 March 2016 Paper
Proc. SPIE. 9776, Extreme Ultraviolet (EUV) Lithography VII
KEYWORDS: Lithography, Optical lithography, Polymers, Capillaries, Nickel, Photoresist materials, Extreme ultraviolet, Integrated circuits, Extreme ultraviolet lithography, High volume manufacturing, Photoresist processing, Semiconducting wafers, Electroplating, Photoresist developing, Liquids

SPIE Journal Paper | 24 December 2015
JM3 Vol. 14 Issue 04
KEYWORDS: Palladium, Platinum, Magnesium, Extreme ultraviolet, Solids, Metals, Lithography, Extreme ultraviolet lithography, Carbon monoxide, Carbonates

SPIE Journal Paper | 7 August 2015
JM3 Vol. 14 Issue 03
KEYWORDS: Line edge roughness, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Photomasks, Scanning electron microscopy, Lithography, Diffraction, Diffraction gratings, Optical lithography

Showing 5 of 8 publications
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