Terry A. Johnson
Sr Member Technical Staff at Sandia National Labs California
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 14 October 2004
Proc. SPIE. 5538, Optical Constants of Materials for UV to X-Ray Wavelengths
KEYWORDS: Carbon, Optical filters, Refractive index, Metals, Nickel, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Niobium, Zirconium

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Reticles, Sensors, Xenon, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics, Fiber optic illuminators

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Lithography, Monochromatic aberrations, Reticles, Wavefronts, Scanning electron microscopy, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers

Proceedings Article | 1 July 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Reticles, Sensors, Wavefronts, Printing, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 1 July 2002
Proc. SPIE. 4688, Emerging Lithographic Technologies VI
KEYWORDS: Lithography, Point spread functions, Reticles, Image resolution, Printing, Projection systems, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 20 August 2001
Proc. SPIE. 4343, Emerging Lithographic Technologies V
KEYWORDS: Wafer-level optics, Optical filters, Visible radiation, Silicon, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Zirconium, Semiconducting wafers, EUV optics

Showing 5 of 6 publications
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