Terunobu Kurosawa
Senior Field Engineer at Brion Technologies KK
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Point spread functions, Electron beams, Data modeling, Scattering, Chromium, Monte Carlo methods, Photomasks, Extreme ultraviolet, Tantalum, Process modeling

PROCEEDINGS ARTICLE | March 13, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Diffractive optical elements, Metals, Manufacturing, Electroluminescence, Photomasks, Logic devices, Source mask optimization, SRAF, Fiber optic illuminators

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Lithography, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Printing, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | May 19, 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Cadmium, Sensors, Calibration, Error analysis, Manufacturing, Scanning electron microscopy, Head, Photomasks, Optical proximity correction, Process modeling

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