CONFERENCE PROCEEDINGS
Advanced Search
Terunobu Kurosawa
Senior Staff Product Engineer at Brion Technologies KK
SPIE Involvement:
Author
Area of Expertise:
Lithography , Simulation , SMO
Publications (5)
Proceedings Article | 29 September 2010 Paper
Mask process correction (MPC) modeling and its application to EUV mask for electron beam mask writer EBM-7000
Takashi Kamikubo, Takayuki Ohnishi, Shigehiro Hara, Hirohito Anze, Yoshiaki Hattori, Shuichi Tamamushi, Shufeng Bai, Jen-Shiang Wang, Rafael Howell, George Chen, Jiangwei Li, Jun Tao, Jim Wiley, Terunobu Kurosawa, Yasuko Saito, Tadahiro Takigawa
Proceedings Volume 7823, 782331 (2010) https://doi.org/10.1117/12.865822
KEYWORDS: Extreme ultraviolet, Data modeling, Photomasks, Scattering, Monte Carlo methods, Point spread functions, Process modeling, Electron beams, Tantalum, Chromium
Proceedings Article | 13 March 2010 Paper
SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance
Seiji Nagahara, Kazuyuki Yoshimochi, Hiroshi Yamazaki, Kazuhiro Takeda, Takayuki Uchiyama, Stephen Hsu, Zhipan Li, Hua-yu Liu, Keith Gronlund, Terunobu Kurosawa, Jun Ye, Luoqi Chen, Hong Chen, Zheng Li, Xiaofeng Liu, Wei Liu
Proceedings Volume 7640, 76401H (2010) https://doi.org/10.1117/12.846473
KEYWORDS: SRAF, Source mask optimization, Photomasks, Metals, Diffractive optical elements, Lithography, Manufacturing, Electroluminescence, Fiber optic illuminators, Logic devices
Proceedings Article | 23 September 2009 Paper
Defect printability analysis by lithographic simulation from high resolution mask images
George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Yasuko Saito, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji
Proceedings Volume 7488, 74880A (2009) https://doi.org/10.1117/12.831475
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Scanners, Sensors, Image resolution, Optical inspection, Wafer-level optics, Printing
Proceedings Article | 11 May 2009 Paper
Mask-LMC: lithographic simulation and defect detection from high-resolution mask images
George Chen, James Wiley, Jen-Shiang Wang, Rafael Howell, Shufeng Bai, Yi-Fan Chen, Frank Chen, Yu Cao, Tadahiro Takigawa, Terunobu Kurosawa, Hideo Tsuchiya, Kinya Usuda, Masakazu Tokita, Fumio Ozaki, Nobutaka Kikuiri, Yoshitake Tsuji
Proceedings Volume 7379, 73791B (2009) https://doi.org/10.1117/12.824288
KEYWORDS: Photomasks, Inspection, Lithography, Semiconducting wafers, Scanners, Sensors, Defect detection, Optical inspection, Wafer-level optics, Image resolution
Proceedings Article | 19 May 2008 Paper
Model based short range mask process correction
G. Chen, J.-S. Wang, S. Bai, R. Howell, J. Wiley, A. Vacca, T. Kurosawa, T. Nishibe, T. Takigawa
Proceedings Volume 7028, 70280G (2008) https://doi.org/10.1117/12.793024
KEYWORDS: Photomasks, Process modeling, Optical proximity correction, Calibration, Scanning electron microscopy, Head, Manufacturing, Cadmium, Sensors, Error analysis
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top