Dr. Teruyuki Hayashi
Senior Supervisor at Tokyo Electron Ltd
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Silica, Silicon, Selenium, Scanning electron microscopy, Monte Carlo methods, Defect inspection, Electron beams, Electron transport, Particles, Defect detection

Proceedings Article | 16 April 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Defect detection, Defect inspection, Inspection, Scanning electron microscopy, Tin, Metals, Electron beams, Photomasks, Semiconducting wafers, Monte Carlo methods

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Defect inspection, Inspection, Inspection equipment, Critical dimension metrology, Etching, Semiconducting wafers, Resistance, FT-IR spectroscopy, Electron beams, Defect detection

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Defect detection, Electron beams, Inspection, Defect inspection, Scanning electron microscopy, Monte Carlo methods, Photoresist processing, Manufacturing, Bridges, Resistance

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top