Dr. Tetsuaki Matsunawa
Research Engineer at Toshiba Memory Corp
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 23 March 2020
Proc. SPIE. 11327, Optical Microlithography XXXIII
KEYWORDS: Lithography, Inverse problems, Photomasks, Convolution, Statistical modeling

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Wafer inspection, Photomasks, Image classification, Convolution, Critical dimension metrology, Semiconducting wafers, System on a chip

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Etching, Manufacturing, Photomasks, Machine learning, Optical proximity correction, Convolution, Semiconducting wafers, Performance modeling, System on a chip

Proceedings Article | 12 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Design for manufacturing, Machine learning, SRAF, Statistical modeling

Proceedings Article | 13 July 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Convolutional neural networks, Neural networks, Semiconductor manufacturing

Showing 5 of 20 publications
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