Dr. Tetsuaki Matsunawa
at Toshiba Corp
SPIE Involvement:
Author
Publications (17)

PROCEEDINGS ARTICLE | October 12, 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Design for manufacturing, Machine learning, SRAF, Statistical modeling

PROCEEDINGS ARTICLE | July 13, 2017
Proc. SPIE. 10454, Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Lithography, Convolutional neural networks, Neural networks, Semiconductor manufacturing

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Wafer-level optics, Lithography, Photovoltaics, Optical lithography, Image processing, Constructive interference, Optical proximity correction, SRAF, Semiconducting wafers, Destructive interference

PROCEEDINGS ARTICLE | March 30, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Lithography, Convolutional neural networks, Data modeling, Image processing, Feature extraction, Neural networks, Design for manufacturing, Photomasks, Optical proximity correction, Convolution, Critical dimension metrology, Semiconducting wafers, Computer architecture, Performance modeling

SPIE Journal Paper | October 21, 2016
JM3 Vol. 15 Issue 04
KEYWORDS: Source mask optimization, Optical proximity correction, Data modeling, Lithography, Feature extraction, Principal component analysis, Model-based design, Performance modeling, Photomasks, Manufacturing

PROCEEDINGS ARTICLE | March 22, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Lithography, Etching, Manufacturing, Computer simulations, Feature extraction, Scanning electron microscopy, Photomasks, Semiconducting wafers, 193nm lithography, Simulation of CCA and DLA aggregates

Showing 5 of 17 publications
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