Tetsunari Furusho
at Tokyo Electron Kyushu Ltd
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Electronics, Scanners, Resistance, Immersion lithography, Logic devices, Thin film coatings, Photoresist processing, Semiconducting wafers, Yield improvement

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Diffractive optical elements, Coating, Reflectivity, Scatterometry, Process control, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Scatter measurement, Process modeling

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