Dr. Tetsunori Murachi Profile

Dr. Tetsunori Murachi

at Intel Kabushiki Kaisha

SPIE Involvement:

Author

Publications (15)

Proceedings Article | 17 April 2014 Paper

Improvement of defect mitigation with EUV actinic blank inspection prototype for 16 nm hp

Tetsunori Murachi, Tsuyoshi Amano, Tomohiro Suzuki, Hiroki Miyai

Proceedings Volume 9048, 904820 (2014) https://doi.org/10.1117/12.2046130

KEYWORDS: Fermium, Extreme ultraviolet, Photomasks, Inspection, Frequency modulation, Extreme ultraviolet lithography, Solids, Coating, Molybdenum, Prototyping

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SPIE Journal Paper | 6 March 2014

Effectiveness of extreme ultraviolet actinic blank inspection prototype for 16-nm half-pitch for mitigation of multilayered defects

Tetsunori Murachi, Tsuyoshi Amano, Tomohiro Suzuki, Hiroki Miyai

JM3, Vol. 13, Issue 01, 013011, (March 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.1.013011

KEYWORDS: Fermium, Extreme ultraviolet, Inspection, Frequency modulation, Photomasks, Multilayers, Extreme ultraviolet lithography, Molybdenum, Solids, Prototyping

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Proceedings Article | 9 September 2013 Paper

Direct phase-shift measurement of an EUV mask with gradient absorber thickness

Hiroyoshi Tanabe, Tetsunori Murachi, Seh-Jin Park, Eric Gullikson, Tsukasa Abe, Naoya Hayashi

Proceedings Volume 8880, 88801D (2013) https://doi.org/10.1117/12.2031135

KEYWORDS: Extreme ultraviolet, Phase measurement, Photomasks, Reflectivity, Phase shifts, Scattering, Data modeling, Reflectometry, Light scattering, Sensors

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SPIE Journal Paper | 31 May 2013

Phase defect mitigation strategy: unveiling fiducial mark requirements on extreme ultraviolet lithography masks

Tetsunori Murachi, Tsuyoshi Amano, Sung Hyun Oh

JM3, Vol. 12, Issue 02, 023008, (May 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.2.023008

KEYWORDS: Fermium, Frequency modulation, Extreme ultraviolet lithography, Etching, Prototyping, Photomasks, Inspection, Palladium, Extreme ultraviolet, Coating

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Proceedings Article | 1 April 2013 Paper

Registration accuracy improvement of fiducial mark on EUVL mask with MIRAI EUV ABI prototype

Tetsunori Murachi, Tsuyoshi Amano

Proceedings Volume 8679, 86791U (2013) https://doi.org/10.1117/12.2011047

KEYWORDS: Fermium, Frequency modulation, Extreme ultraviolet, Image registration, Extreme ultraviolet lithography, Prototyping, Photomasks, Etching, Inspection, Coating

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Proceedings Article | 8 November 2012 Paper

Fiducial mark requirements from the viewpoints of actinic blank inspection tool for phase-defect mitigation on EUVL mask

Tetsunori Murachi, Tsuyoshi Amano, Sung Oh

Proceedings Volume 8522, 85221U (2012) https://doi.org/10.1117/12.976819

KEYWORDS: Fermium, Frequency modulation, Coating, Extreme ultraviolet lithography, Inspection, Photomasks, Prototyping, Etching, Extreme ultraviolet, Image registration

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Proceedings Article | 30 June 2012 Paper

Direct phase-shift measurement of thin and thick absorber EUV masks

Tetsunori Murachi, Hiroyoshi Tanabe, Seh-Jin Park, Eric Gullikson, Taichi Ogase, Tsukasa Abe, Naoya Hayashi

Proceedings Volume 8441, 84411M (2012) https://doi.org/10.1117/12.976817

KEYWORDS: Reflectivity, Photomasks, Phase measurement, Extreme ultraviolet, Extreme ultraviolet lithography, Reflectometry, Phase shifts, Scatterometry, Optical testing, Scatter measurement

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Proceedings Article | 23 March 2012 Paper

Phase defect mitigation strategy: fiducial mark requirements on extreme ultraviolet lithography mask

Tetsunori Murachi, Tsuyoshi Amano, Sung Hyun Oh

Proceedings Volume 8322, 83221Q (2012) https://doi.org/10.1117/12.916141

KEYWORDS: Fermium, Frequency modulation, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Etching, Double positive medium, Charge-coupled devices, Signal detection, Lithography

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Proceedings Article | 23 March 2012 Paper

Impact of the phase defect structure on an actinic dark-field blank inspection signal and wafer printability

Tsuyoshi Amano, Tetsunori Murachi, Takeshi Yamane, Yukiyasu Arisawa, Tsuneo Terasawa

Proceedings Volume 8322, 832234 (2012) https://doi.org/10.1117/12.916309

KEYWORDS: Palladium, Signal detection, Semiconducting wafers, Defect detection, Extreme ultraviolet, Inspection, Transmission electron microscopy, Printing, Photomasks, Wafer inspection

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Proceedings Article | 14 October 2011 Paper

Phase-shifting effect of thin-absorber EUV masks

Hiroyoshi Tanabe, Tetsunori Murachi, Sang H. Lee, Manish Chandhok, Seh-Jin Park, Guojing Zhang, Tsukasa Abe, Taichi Ogase, Naoya Hayashi

Proceedings Volume 8166, 816618 (2011) https://doi.org/10.1117/12.895149

KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Reflectivity, Phase shifting, Semiconducting wafers, Refractive index, Lithography, Binary data, Extreme ultraviolet lithography

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Proceedings Article | 7 April 2011 Paper

CD correction for half pitch 2x-nm on extreme ultraviolet lithography

Hajime Aoyama, Yuusuke Tanaka, Kazuo Tawarayama, Yukiyasu Arisawa, Taiga Uno, Takashi Kamo, Toshihiko Tanaka, Alan Myers, Yashesh Shroff, Tetsunori Murachi, Gilroy Vandentop, Ichiro Mori

Proceedings Volume 7969, 79691J (2011) https://doi.org/10.1117/12.878672

KEYWORDS: Critical dimension metrology, Scanning electron microscopy, Extreme ultraviolet lithography, Logic, Photomasks, Optical proximity correction, Model-based design, Lithography, Point spread functions, Electronic design automation

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Proceedings Article | 18 March 2009 Paper

Demonstration of full-field patterning of 32 nm test chips using EUVL

Gilroy Vandentop, Manish Chandhok, Ernisse Putna, Todd Younkin, James Clarke, Steven Carson, Alan Myers, Michael Leeson, Guojing Zhang, Ted Liang, Tetsunori Murachi

Proceedings Volume 7271, 727116 (2009) https://doi.org/10.1117/12.814436

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

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Proceedings Article | 7 October 2005 Paper

Characteristics of SiC/Mg multilayer mirrors

Tetsunori Murachi, Ichiro Yoshikawa, Hisataka Takenaka, Satoshi Ichimaru

Proceedings Volume 5900, 59001A (2005) https://doi.org/10.1117/12.616538

KEYWORDS: Reflectivity, Multilayers, Mirrors, Coating, Extreme ultraviolet, Atmospheric modeling, Helium, Neodymium, Silicon carbide, Atmospheric optics

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Proceedings Article | 18 October 2004 Paper

New multilayer coating for 30.4-nm radiation

Ichiro Yoshikawa, Tetsunori Murachi

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.558976

KEYWORDS: Reflectivity, Multilayers, Mirrors, Coating, Silicon carbide, Extreme ultraviolet, Helium, Satellites, Magnesium, Extreme ultraviolet lithography

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Proceedings Article | 13 January 2004 Paper

Development of an extreme-ultraviolet imaging spectrometer for the Mercury mission

Ichiro Yoshikawa, Tetsunori Murachi, Shingo Kameda, Atsushi Yamazaki, Shoichi Okano, Masato Nakamura

Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.504964

KEYWORDS: Spectroscopy, Extreme ultraviolet, Mercury (planet), Ultraviolet radiation, Coating, Sensors, Sodium, Mercury, Microchannel plates, Reflectivity

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Showing 5 of 15 publications

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