Tetsunori Murachi
at Intel Kabushiki Kaisha
SPIE Involvement:
Author
Publications (15)

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Coating, Inspection, Frequency modulation, Solids, Photomasks, Extreme ultraviolet, Fermium, Extreme ultraviolet lithography, Molybdenum, Prototyping

SPIE Journal Paper | March 6, 2014
JM3 Vol. 13 Issue 01
KEYWORDS: Fermium, Extreme ultraviolet, Inspection, Frequency modulation, Photomasks, Multilayers, Extreme ultraviolet lithography, Molybdenum, Solids, Prototyping

PROCEEDINGS ARTICLE | September 9, 2013
Proc. SPIE. 8880, Photomask Technology 2013
KEYWORDS: Data modeling, Scattering, Sensors, Light scattering, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Phase measurement, Phase shifts

SPIE Journal Paper | May 31, 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Fermium, Frequency modulation, Extreme ultraviolet lithography, Etching, Prototyping, Photomasks, Inspection, Palladium, Extreme ultraviolet, Coating

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Etching, Coating, Inspection, Image registration, Frequency modulation, Photomasks, Extreme ultraviolet, Fermium, Extreme ultraviolet lithography, Prototyping

PROCEEDINGS ARTICLE | November 8, 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Etching, Coating, Inspection, Image registration, Frequency modulation, Photomasks, Extreme ultraviolet, Fermium, Extreme ultraviolet lithography, Prototyping

Showing 5 of 15 publications
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