Dr. Tetsuro Hanawa
Senior Engineer at Renesas Technology Corp
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 1 April 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymers, Scanners, Coating, Photomasks, Chemical analysis, Critical dimension metrology, Fluorine, Photoresist processing, Semiconducting wafers

Proceedings Article | 16 March 2009
Proc. SPIE. 7274, Optical Microlithography XXII
KEYWORDS: Lithography, Diffraction, Apodization, Optical lithography, Polarization, Radiometric corrections, Magnetism, Image filtering, Photomasks, Electromagnetism

Proceedings Article | 19 May 2008
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Logic, Image processing, Photography, Scanning electron microscopy, Printing, Transmittance, Photomasks, Immersion lithography, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 26 March 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Particles, Silicon, Calcium, Coating, Manufacturing, Immersion lithography, Head-mounted displays, Fluorine, Semiconducting wafers, Prototyping

Proceedings Article | 12 March 2008
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Optical lithography, Imaging systems, Opacity, Photography, Image acquisition, Chromium, Scanning electron microscopy, Image transmission, Photomasks, Optical proximity correction

Showing 5 of 20 publications
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