Dr. Tetsuro Nakasugi
at Toshiba Corp
SPIE Involvement:
Author
Publications (32)

Proceedings Article | 26 March 2019
Proc. SPIE. 10958, Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019
KEYWORDS: Lithography, Optical lithography, Image processing, Particles, Distortion, Photomasks, Nanoimprint lithography, Photoresist processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 May 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Particles, Distortion, Extreme ultraviolet lithography, Nanoimprint lithography, Optical alignment, Photoresist processing, Semiconducting wafers, Overlay metrology

Proceedings Article | 23 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Nanotechnology, Lithography, Etching, Manufacturing, Process control, Photomasks, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Photoresist processing

Proceedings Article | 21 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Etching, Image processing, Ultraviolet radiation, Interfaces, Diffusion, Nanoimprint lithography, Photoresist processing, Liquids

Proceedings Article | 19 March 2018
Proc. SPIE. 10584, Novel Patterning Technologies 2018
KEYWORDS: Lithography, Optical lithography, Design for manufacturing, Source mask optimization, Optical proximity correction, High volume manufacturing, Nanoimprint lithography, Photoresist processing, Process modeling

Showing 5 of 32 publications
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