Tetsuya Oshino
at Nikon Corp
SPIE Involvement:
Author
Publications (26)

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Carbon, Apodization, Mirrors, Multilayers, Contamination, Silicon, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Oxidation

PROCEEDINGS ARTICLE | April 6, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Contamination, Chemical species, Photons, Molecules, Reflectivity, Oxygen, Extreme ultraviolet, Protactinium

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Carbon, Mirrors, Optical design, Contamination, Oxygen, Transmittance, Extreme ultraviolet, Extreme ultraviolet lithography, Synchrotrons, Wavefront metrology

PROCEEDINGS ARTICLE | March 23, 2010
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Wafer-level optics, Point spread functions, Mirrors, Multilayers, Spatial frequencies, Light scattering, Reflectivity, Surface roughness, Extreme ultraviolet, Semiconducting wafers

SPIE Journal Paper | October 1, 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, EUV optics, Resolution enhancement technologies, Multilayers, Reflectivity, Lithographic illumination

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mirrors, Eye, Polishing, Reflectivity, Wavefronts, Aspheric optics, Projection systems, Extreme ultraviolet, Extreme ultraviolet lithography, Resolution enhancement technologies

Showing 5 of 26 publications
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