Dr. Tetsuya Shinjo
at Nissan Chemical Industries Ltd
SPIE Involvement:
Author
Publications (9)

PROCEEDINGS ARTICLE | March 19, 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Carbon, Lithography, Etching, Polymers, Hydrogen, Resistance, Inspection, Photomasks, Semiconducting wafers, System on a chip

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Multilayers, Sensors, Etching, Silicon, Materials processing, Reflectivity, Immersion lithography, Semiconducting wafers, System on a chip

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Etching, Polymers, Dielectrics, Silicon, Coating, Reflectivity, Reactive ion etching, Semiconducting wafers, Bottom antireflective coatings

PROCEEDINGS ARTICLE | March 30, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Lithography, Etching, Polymers, Copper, Silicon, Coating, Photoresist processing, Semiconducting wafers, Bottom antireflective coatings

PROCEEDINGS ARTICLE | March 26, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Ultraviolet radiation, Silicon, Photoresist materials, Extreme ultraviolet, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Antireflective coatings, Etching, Coating, Photoresist materials, Reactive ion etching, Thin film coatings, Semiconducting wafers, Photoresist developing, Standards development

Showing 5 of 9 publications
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