Dr. Tetsuya Shinjo Profile

Dr. Tetsuya Shinjo

at Nissan Chemical Corp

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Author

Publications (9)

Proceedings Article | 19 March 2012 Paper

Spin-on-carbon-hardmask with high wiggling resistance

Hirokazu Nishimaki, Rikimaru Sakamoto, Keisuke Hashimoto, Tetsuya Shinjo, Yasunobu Someya, Ryo Karasawa, Takashi Matsumoto

Proceedings Volume 8325, 83250U (2012) https://doi.org/10.1117/12.916128

KEYWORDS: Etching, Resistance, System on a chip, Hydrogen, Carbon, Photomasks, Semiconducting wafers, Polymers, Lithography, Inspection

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Proceedings Article | 4 December 2008 Paper

Development of multi-layer process materials for hyper-NA lithography process

Makoto Nakajima, Yasushi Sakaida, Tetsuya Shinjo, Keisuke Hashimoto

Proceedings Volume 7140, 71403Z (2008) https://doi.org/10.1117/12.804688

KEYWORDS: System on a chip, Silicon, Etching, Lithography, Reflectivity, Semiconducting wafers, Materials processing, Multilayers, Sensors, Immersion lithography

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Proceedings Article | 15 April 2008 Paper

High-etch-rate bottom-antireflective coating and gap-fill materials using dextrin derivatives in via first dual-damascene lithography process

Yasushi Sakaida, Keisuke Hashimoto, Tetsuya Shinjo, Satoshi Takei, Yasuyuki Nakajima

Proceedings Volume 6923, 69232P (2008) https://doi.org/10.1117/12.771902

KEYWORDS: Etching, Lithography, Polymers, Reflectivity, Coating, Semiconducting wafers, Silicon, Reactive ion etching, Dielectrics, Bottom antireflective coatings

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Proceedings Article | 30 March 2007 Paper

Effect of solvents and cross-link reaction group concentration on via filling performance in gap fill materials

Satoshi Takei, Yasushi Sakaida, Tetsuya Shinjo

Proceedings Volume 6519, 65192V (2007) https://doi.org/10.1117/12.711308

KEYWORDS: Lithography, Polymers, Semiconducting wafers, Coating, Silicon, Etching, Bottom antireflective coatings, Photoresist processing, Copper, Semiconductors

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Proceedings Article | 26 March 2007 Paper

Novel approach of UV cross- link process for advanced planarization technology in 32-45 nm lithography

Yasuyuki Nakajima, Mitsuaki Iwashita, Tetsuya Shinjo, Katsuhiro Tsuchiya, Satoshi Takei, Yusuke Horiguchi, Bang-Ching Ho, Yuichi Mano, Makoto Muramatsu

Proceedings Volume 6519, 651933 (2007) https://doi.org/10.1117/12.711362

KEYWORDS: Extreme ultraviolet, Ultraviolet radiation, Lithography, Etching, Semiconducting wafers, Silicon, Optical lithography, Photoresist processing, Dry etching, Photoresist materials

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Proceedings Article | 23 March 2007 Paper

Wet-recess gap-fill materials for an advanced dual damascene process

Tetsuya Shinjo, Yusuke Horiguchi, Satoshi Takei, Yasuyuki Nakajima

Proceedings Volume 6519, 651930 (2007) https://doi.org/10.1117/12.712461

KEYWORDS: Semiconducting wafers, Etching, Photoresist materials, Standards development, Lithography, Photoresist developing, Reactive ion etching, Thin film coatings, Coating, Antireflective coatings

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Proceedings Article | 11 April 2006 Paper

New advanced BARC and gap fill materials based on sublimate reduction for 193nm lithography

Yasuyuki Nakajima, Tetsuya Shinjo, Yasushi Sakaida, Satoshi Takei, Yusuke Horiguchi

Proceedings Volume 6153, 61532Q (2006) https://doi.org/10.1117/12.655398

KEYWORDS: Etching, Photoresist materials, Semiconducting wafers, Polymers, Silicon, Coating, Lithography, 193nm lithography, Reflectivity, Absorbance

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Proceedings Article | 29 March 2006 Paper

New chemical approach for resist poisoning problem in via first dual-damascene process

Satoshi Takei, Yasuyuki Nakajima, Hajime Nakao, Tetsuya Shinjo

Proceedings Volume 6153, 61532O (2006) https://doi.org/10.1117/12.655529

KEYWORDS: Contamination, Photoresist processing, Lithography, Chemical reactions, Annealing, Diffusion, Semiconducting wafers, Silicon, Cadmium sulfide, Polymers

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Proceedings Article | 4 May 2005 Paper

ARC and gap fill material with high etch rate for advanced dual damascene process

Yasuyuki Nakajima, Anwei Qin, Yasushi Sakaida, Tetsuya Shinjo, Satoshi Takei

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599249

KEYWORDS: Etching, Photoresist materials, Semiconducting wafers, Silicon, Reflectivity, Coating, Lithography, Copper, Polymers, Dielectrics

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Showing 5 of 9 publications

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