Dr. Tetsuya Shinjo
at Nissan Chemical Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 19 March 2012
Proc. SPIE. 8325, Advances in Resist Materials and Processing Technology XXIX
KEYWORDS: Carbon, Lithography, Etching, Polymers, Hydrogen, Resistance, Inspection, Photomasks, Semiconducting wafers, System on a chip

Proceedings Article | 4 December 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Multilayers, Sensors, Etching, Silicon, Materials processing, Reflectivity, Immersion lithography, Semiconducting wafers, System on a chip

Proceedings Article | 15 April 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Etching, Polymers, Dielectrics, Silicon, Coating, Reflectivity, Reactive ion etching, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 30 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Lithography, Etching, Polymers, Copper, Silicon, Coating, Photoresist processing, Semiconducting wafers, Bottom antireflective coatings

Proceedings Article | 26 March 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Optical lithography, Etching, Dry etching, Ultraviolet radiation, Silicon, Photoresist materials, Extreme ultraviolet, Photoresist processing, Semiconducting wafers

Showing 5 of 9 publications
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