Theo M. Modderman
at ASML Netherlands BV
SPIE Involvement:
Publications (4)

Proceedings Article | 27 June 2019 Paper
Derk Brouns, Par Broman, Jan-Willem van der Horst, Raymond Lafarre, Raymond Maas, Theo Modderman, Roel Notermans, Guido Salmaso
Proceedings Volume 11178, 1117806 (2019)
KEYWORDS: Pellicles, Extreme ultraviolet, Semiconducting wafers, Reflectivity, Extreme ultraviolet lithography, Reticles, Particles, Reflection, Scanners, Photomasks

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 61541W (2006)
KEYWORDS: Polarization, Combined lens-mirror systems, Semiconducting wafers, Curtains, Lens design, Lithographic illumination, Fiber optic illuminators, Lithography, Mirrors, Imaging systems

Proceedings Article | 28 May 2004 Paper
Theo Modderman, Hans Jasper, Herman Boom, Tammo Uitterdijk, Stephane Dana, Harry Sewell, Timothy O'Neil, Jan Mulkens, Martin Brunotte, Birgit Mecking, Toralf Gruner
Proceedings Volume 5377, (2004)
KEYWORDS: Reticles, Pellicles, Lithography, Chemical elements, Oxygen, Contamination, Optical lithography, Scanners, Distortion, Surface finishing

Proceedings Article | 14 September 2001 Paper
Boudewijn Sluijk, Tom Castenmiller, Richard du Croo de Jongh, Hans Jasper, Theo Modderman, Leon Levasier, Erik Loopstra, Guustaaf Savenije, Marc Boonman, Harry Cox
Proceedings Volume 4346, (2001)
KEYWORDS: Semiconducting wafers, Optical alignment, Lithography, Sensors, Imaging systems, Metrology, Reticles, Optical lithography, Overlay metrology, Optical scanning systems

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