Theo M. Modderman
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 27 June 2019
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Reticles, Reflection, Scanners, Particles, Reflectivity, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Mirrors, Curtains, Lithographic illumination, Polarization, Imaging systems, Lens design, Semiconducting wafers, Combined lens-mirror systems, Fiber optic illuminators

Proceedings Article | 28 May 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Reticles, Optical lithography, Contamination, Scanners, Distortion, Oxygen, Pellicles, Chemical elements, Surface finishing

Proceedings Article | 14 September 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Reticles, Metrology, Optical lithography, Imaging systems, Sensors, Optical alignment, Optical scanning systems, Semiconducting wafers, Overlay metrology

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